Junction Photo Voltage(JPV)
Using the JPV method, non-contact measurement of junction leakage in PN junctions, evaluation of the depletion layer capacitance, and rapid measurement of the sheet resistance of PN junction samples!
The JPV method (Junction Photo Voltage method) allows for fast and reproducible mapping measurements. 【Features】 - Non-contact, non-destructive measurement - No adjustment of probes required - No special sample preparation needed for measurement - Measurement possible even with oxide films or coatings on the surface - High spatial resolution distribution measurement (mapping) can be performed quickly - Highly reproducible measurements are possible - Can be integrated with Semilab's benchtop platforms WT-2000, WT-2500, WT-3000, or inline wafer testing equipment.
- Company:日本セミラボ 新横浜本社
- Price:Other